DocumentCode :
1894028
Title :
Metallization for microelectronics program at the University at Albany: leveraging a long-term mentor relationship
Author :
Fury, Michael A. ; Kaloyeros, Alain E.
Author_Institution :
IBM Corp., Hopewell Junction, NY, USA
fYear :
1993
fDate :
18-19 May 1993
Firstpage :
59
Lastpage :
64
Abstract :
The program in chemical vapor deposition, (CVD) of metals for microelectronics applications at the University at Albany, SUNY, is presented as a working model for a broad, basic and applied research program. The proximity of SUNYA to IBM facilities has allowed the role of industrial mentor to expand to include appointment as adjunct professor or industry advisor to a Semiconductor Research Corporation fellow, and to submission of research proposals with a mentor as co-principal investigator and as associate director. Such depth of mutual commitment serves to ensure industrial relevance for both students and faculty. It provides a reliable resource for precompetitive research and early development
Keywords :
chemical vapour deposition; integrated circuit technology; metallisation; research and development management; CVD; IBM facilities; SUNYA; chemical vapor deposition; long-term mentor relationship; metallisation; metals; microelectronics program; research program; Chemical elements; Chemical vapor deposition; Costs; Joining materials; Metallization; Microelectronics; Proposals; Semiconductor thin films; Sputtering; Technology transfer;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial
Conference_Location :
Research Triangle Park, NC
ISSN :
0749-6877
Print_ISBN :
0-7803-0990-1
Type :
conf
DOI :
10.1109/UGIM.1993.297036
Filename :
297036
Link To Document :
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