A transfer to industry of design for manufacturing technology

Author

Sanders, T.J.

fYear

1993

fDate

18-19 May 1993

Firstpage

51

Lastpage

55

Abstract

The results of a program conducted at Florida Institute of Technology to transfer design-for-manufacturing technology to the semiconductor industry are presented. Significant technical results have been achieved. The ability of the STADIUM methodology to predict the statistical variations of the NDMOS device drain to source on resistance (Rdson) are demonstrated. This modeling technique can be used to optimize the process as well as the product design

Keywords

circuit CAD; integrated circuit manufacture; production engineering computing; semiconductor process modelling; statistical analysis; technology transfer; BiCMOS process; N-type diffused channel MOS power transistor; NDMOS device; STADIUM methodology; design for manufacturing technology; modeling technique; process optimisation; product design; semiconductor industry; statistical variations; technology transfer; Conductors; Design for manufacture; Electronics industry; Hardware; Integrated circuit technology; Manufacturing industries; Power transistors; Semiconductor device manufacture; Software packages; Technology transfer;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial

Conference_Location

Research Triangle Park, NC

ISSN

0749-6877

Print_ISBN

0-7803-0990-1

Type

conf

DOI

10.1109/UGIM.1993.297038

Filename

297038