• DocumentCode
    1894479
  • Title

    Robust optimization of serial link system for signal integrity and power integrity

  • Author

    Tripathi, Jai Narayan ; Nagpal, Raj Kumar ; Malik, Rakesh

  • Author_Institution
    Dept. of EE, IIT Bombay, Mumbai, India
  • fYear
    2010
  • fDate
    25-26 Nov. 2010
  • Firstpage
    1
  • Lastpage
    8
  • Abstract
    Signal Integrity (SI) and Power Integrity (PI) are the most critical issues for higher operational speeds in semiconductor industry. This work identifies and optimizes the parameters of board, package and termination environment, influencing the signal integrity and power integrity of serial link. System level model has been created for USB HSLINK taking into account the external parameters like board, package, measurement environment which influence the performance of the channel. Parameters variations appearing from manufacturability constraints, material property constraints, design tolerance etc affecting the serial link performance has been optimized using Taguchi method based on statistical co-analysis. Using the Taguchi statistical techniques, sensitivity analysis on parameter variations affecting HSLINK performance is analyzed and optimized for desired performance.
  • Keywords
    Taguchi methods; error statistics; peripheral interfaces; power supplies to apparatus; statistical analysis; Taguchi method; Taguchi statistical techniques; USB HSLINK performance; bit error rate; design tolerance; manufacturability constraints; power integrity; serial link performance; serial link system optimization; signal integrity; statistical co-analysis; system level model; termination environment; Bit error rate; Jitter; Noise; Optimization; Robustness; Silicon; Universal Serial Bus; Bit error Rate (BER); High Speed Data Transmission; Power Integrity; Robust Optimization; Serial links; Signal Integrity; Taguchi Methods;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Networked Embedded Systems for Enterprise Applications (NESEA), 2010 IEEE International Conference on
  • Conference_Location
    Suzhou
  • Print_ISBN
    978-1-4244-9178-0
  • Electronic_ISBN
    978-1-4244-9176-6
  • Type

    conf

  • DOI
    10.1109/NESEA.2010.5678052
  • Filename
    5678052