DocumentCode :
1894484
Title :
Plasma standard cell for laboratory demonstrations and experiments
Author :
Lane, Richard L. ; Grimsley, Thomas J.
Author_Institution :
Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA
fYear :
1993
fDate :
18-19 May 1993
Firstpage :
213
Lastpage :
218
Abstract :
The design, construction, and use of an apparatus for undergraduate laboratory experimentation and demonstration in the area of plasma technology and processes are described. Specific experiments being utilized are detailed. Plans for additional equipment features are discussed
Keywords :
demonstrations; education; integrated circuit technology; laboratory apparatus and techniques; plasma applications; semiconductor technology; laboratory apparatus; laboratory demonstrations; microelectronic fabrication; plasma processes; plasma standard cell; plasma technology; undergraduate laboratory experimentation; Educational institutions; Electrodes; Fabrication; Laboratories; Microelectronics; Plasma applications; Plasma materials processing; Sputter etching; Sputtering; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial
Conference_Location :
Research Triangle Park, NC
ISSN :
0749-6877
Print_ISBN :
0-7803-0990-1
Type :
conf
DOI :
10.1109/UGIM.1993.297055
Filename :
297055
Link To Document :
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