Surface morphology, microstructure and mechanical properties of thin Ag films

Author

Shugurov, Artur ; Panin, Alexey ; Chun, Hui-Gon ; Oskomov, Konstantin

Author_Institution

Inst. of Strength Phys. & Mater. Sci., Tomsk, Russia

Volume

1

fYear

2003

fDate

6-6 July 2003

Firstpage

21

Abstract

Thin Ag films deposited onto SiO/sub 2//Si substrates by DC magnetron sputtering and thereafter annealed at temperatures 100-500/spl deg/C are investigated by scanning tunneling and atomic force microscopy. It is shown that the film surface topography and microstructure are considerably changed as a result of annealing. To provide a quantitative estimation of the surface topography changes of Ag films the surface fractal dimension was calculated. Elasticity and hardness of the films are studied by a nanoindentation technique. The films are found to have value of elastic modulus close to that of bulk silver while their hardness and yield stress are essentially higher.

Keywords

atomic force microscopy; hardness; indentation; metallic thin films; scanning tunnelling microscopy; silver; sputter deposition; surface morphology; surface topography; yield stress; 100 to 500 degC; Ag; DC magnetron sputtering; SiO/sub 2/-Si; atomic force microscopy; bulk silver; film surface topography; nanoindentation technique; surface fractal dimension; surface morphology; thin Ag films deposition; yield stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Science and Technology, 2003. Proceedings KORUS 2003. The 7th Korea-Russia International Symposium on

Conference_Location

Ulsan, South Korea

Print_ISBN

89-7868-617-6

Type

conf

Filename

1222386