• DocumentCode
    1894929
  • Title

    Analysis of stress in power bipolar devices during inductive turn-off

  • Author

    Fratelli, Luigi ; Vitale, Gianfranco ; Spirito, Paolo

  • Author_Institution
    Dept. of Electron. Eng., Naples Univ., Italy
  • fYear
    1993
  • fDate
    18-20 May 1993
  • Firstpage
    171
  • Lastpage
    176
  • Abstract
    The turnoff transients under inductive load of bipolar junction transistors (BJTs) and bipolar-mode field effect transistors (BMFETs) have been calculated, with the aim of investigating the factors which limit the reverse bias safe operating areas of these devices. Results of 2D simulations which include impact ionization in a self-consistent way show that different device structures exhibit different voltage limitations at high currents, and that, for the same maximum voltage, large differences in the power density distribution can account for the difference in ruggedness which is observed experimentally. The inclusion of a buffer layer in the BJT improves its turnoff performance, provided that this layer is sufficiently thick and doped. In BMFETs the sustaining voltage locus is vertical, and there is no sensitive power concentration at the junction epilayer-substrate, even if no buffer layer is included
  • Keywords
    bipolar transistors; field effect transistors; impact ionisation; power transistors; bipolar junction transistors; bipolar-mode field effect transistors; buffer layer; device structures; impact ionization; inductive load; inductive turn-off; junction epilayer-substrate; power bipolar devices; power density distribution; reverse bias safe operating areas; sustaining voltage locus; turnoff transients; voltage limitations; Breakdown voltage; Buffer layers; Conductivity; Degradation; Doping profiles; FETs; Impact ionization; Power engineering and energy; Stress; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 1993. ISPSD '93., Proceedings of the 5th International Symposium on
  • Conference_Location
    Monterey, CA
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-1313-5
  • Type

    conf

  • DOI
    10.1109/ISPSD.1993.297085
  • Filename
    297085