DocumentCode :
1895499
Title :
Nickel — Alumina nanostructures formation by electrochemical processing for high-density data storage devices
Author :
Sokol, V.A. ; Vorobjova, A.I. ; Outkina, E.A.
Author_Institution :
Belarussian State Univ. of Inf. & Radioelectron., Minsk, Belarus
fYear :
2012
fDate :
10-14 Sept. 2012
Firstpage :
701
Lastpage :
702
Abstract :
The features of uniform nickel electrochemical deposition into the pores of thin ordered porous anodic alumina (PA) are considered. The influence of deposition conditions on ordering and topological parameters of nickel nanopillars are investigated. The impact of the barrier layer thinning process at the PA pores bottom on the origination and growth of the ordered metal nanopillars is discussed.
Keywords :
alumina; electrodeposition; nanofabrication; nanoporous materials; nickel; Ni-Al2O3; barrier layer thinning; electrochemical deposition; high-density data storage devices; nickel nanopillars; nickel-alumina nanostructures; ordered metal nanopillars; thin-ordered porous anodic alumina pores; topological parameters; Aluminum; Anodes; Electronic mail; Films; Nickel; Perpendicular magnetic recording; Surface treatment;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Telecommunication Technology (CriMiCo), 2012 22nd International Crimean Conference
Conference_Location :
Sevastopol, Crimea
Print_ISBN :
978-1-4673-1199-1
Type :
conf
Filename :
6336155
Link To Document :
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