• DocumentCode
    1895690
  • Title

    A merged MuGFET and planar SOI process

  • Author

    Marshall, Andrew ; Cleavelin, C. Rinn ; Xiong, Weize ; Pacha, Christian ; Knoblinger, Gerhard ; Armin, Klaus Von ; Schulz, Thomas ; Schruefer, Klaus ; Matthews, Ken ; Molzer, Wolfgang ; Patruno, Paul ; Russ, Christian

  • Author_Institution
    Texas Instruments Inc., Dallas, USA
  • fYear
    2007
  • fDate
    26-29 Sept. 2007
  • Firstpage
    39
  • Lastpage
    42
  • Abstract
    Tri-gate MuGFET (Multi-Gate FET) offers advantages compared to bulk silicon, with respect to circuit design, but also has some potential drawbacks in thermal effects and width quantization. An advantage of MuGFET is that with the same processing it is possible to make planar SOI structures, which, depending upon the active silicon thickness, may be fully or partially depleted. This work investigates circuit operation on a merged MuGFET and planar SOI process.
  • Keywords
    Annealing; Circuit synthesis; Doping; FETs; History; Hydrogen; Instruments; MOS devices; Quantization; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOC Conference, 2007 IEEE International
  • Conference_Location
    Hsin Chu, Taiwan
  • Print_ISBN
    978-1-4244-1592-2
  • Electronic_ISBN
    978-1-4244-1593-9
  • Type

    conf

  • DOI
    10.1109/SOCC.2007.4545421
  • Filename
    4545421