DocumentCode
1899347
Title
A novel approach to dual damascene patterning
Author
Hussein, Makarem ; Sivakumar, Sam ; Brain, Ruth ; Beattie, Bruce ; Nguyen, Phi ; Fradkin, Mark
Author_Institution
Portland Technol. Dev., Intel Corp., Hillsboro, OR, USA
fYear
2002
fDate
2002
Firstpage
18
Lastpage
20
Abstract
In this paper, we present and discuss a novel approach to dual damascene patterning based on the invention of SLAM (Sacrificial Light Absorbing Material). We will focus on dual damascene patterning problems that led to the invention of SLAM, and present a side-by-side comparison of the patterning performance of SLAM-assisted dual damascene patterning and a Bottom Anti-Reflective Coating (BARC), the industry´s primary approach. SLAM-assisted dual damascene patterning is an enabling technology for Intel´s 130 nm technology and beyond.
Keywords
antireflection coatings; light absorption; metallisation; 130 nm; bottom antireflective coating; dual damascene patterning; sacrificial light absorbing material; Absorption; Coatings; Dielectric materials; Dielectric substrates; Dry etching; Polymers; Reflectivity; Resists; Simultaneous localization and mapping; Space technology;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference, 2002. Proceedings of the IEEE 2002 International
Print_ISBN
0-7803-7216-6
Type
conf
DOI
10.1109/IITC.2002.1014874
Filename
1014874
Link To Document