Title :
A novel approach to dual damascene patterning
Author :
Hussein, Makarem ; Sivakumar, Sam ; Brain, Ruth ; Beattie, Bruce ; Nguyen, Phi ; Fradkin, Mark
Author_Institution :
Portland Technol. Dev., Intel Corp., Hillsboro, OR, USA
Abstract :
In this paper, we present and discuss a novel approach to dual damascene patterning based on the invention of SLAM (Sacrificial Light Absorbing Material). We will focus on dual damascene patterning problems that led to the invention of SLAM, and present a side-by-side comparison of the patterning performance of SLAM-assisted dual damascene patterning and a Bottom Anti-Reflective Coating (BARC), the industry´s primary approach. SLAM-assisted dual damascene patterning is an enabling technology for Intel´s 130 nm technology and beyond.
Keywords :
antireflection coatings; light absorption; metallisation; 130 nm; bottom antireflective coating; dual damascene patterning; sacrificial light absorbing material; Absorption; Coatings; Dielectric materials; Dielectric substrates; Dry etching; Polymers; Reflectivity; Resists; Simultaneous localization and mapping; Space technology;
Conference_Titel :
Interconnect Technology Conference, 2002. Proceedings of the IEEE 2002 International
Print_ISBN :
0-7803-7216-6
DOI :
10.1109/IITC.2002.1014874
