DocumentCode :
1902446
Title :
Recessed Metal/Silicon Contact Resistance Measured by the Cross-Bridge-Kelvin Resistor Structure - Numerical Analysis
Author :
Bing-Yue Tsui ; Mao-Chieh Chen
Author_Institution :
Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University, Taiwan
fYear :
1993
fDate :
6-7 March 1993
Firstpage :
99
Lastpage :
100
Keywords :
Area measurement; Conductivity; Contact resistance; Electrical resistance measurement; Phase change materials; Predictive models; Resistors; Silicon; Substrates; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Modeling & Simulation, 1993. SMS Technical Digest. 1993 Symposium on
Conference_Location :
Taipei, Taiwan
Print_ISBN :
0-7803-1225-2
Type :
conf
DOI :
10.1109/SMS.1993.664574
Filename :
664574
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1902446
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