DocumentCode :
1902883
Title :
Investigation about the high-temperature impact-ionization coefficient in silicon
Author :
Reggiani, S. ; Rudan, M. ; Gnani, E. ; Baccarani, G.
Author_Institution :
DEIS, Bologna Univ., Italy
fYear :
2004
fDate :
21-23 Sept. 2004
Firstpage :
245
Lastpage :
248
Abstract :
In this work, we address the problem of field- and temperature-dependence of the impact-ionization coefficient in silicon. A careful prediction of the impact-ionization phenomenon is essential for the design of devices working in high-current/voltage conditions, where self heating is relevant. A new model is proposed, fitted on first-principle calculations, that demonstrates the essential role played by the non-equilibrium Auger effect, which is neglected in standard approaches. The model is corroborated by a theoretical analysis, that confirms the numerical findings about the field and temperature dependencies.
Keywords :
Auger effect; elemental semiconductors; impact ionisation; semiconductor device models; silicon; Si; high-current/voltage operating conditions; high-temperature impact-ionization coefficient; impact-ionization field-dependence; impact-ionization temperature-dependence; nonequilibrium Auger effect; self heating; Electrons; Electrostatic discharge; Heating; Ionization; Predictive models; Scattering; Silicon; Temperature dependence; Temperature distribution; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research conference, 2004. ESSDERC 2004. Proceeding of the 34th European
Print_ISBN :
0-7803-8478-4
Type :
conf
DOI :
10.1109/ESSDER.2004.1356535
Filename :
1356535
Link To Document :
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