Title :
Finite Element Analysis of Thermal Effects in an X-Ray Mask
Author :
Li, D.C. ; Chen, J.T. ; Chyuan, S.W. ; Sun, C.Y.
Keywords :
Atmospheric modeling; Biomembranes; Civil engineering; Finite element methods; Resists; Sun; Temperature distribution; Thermal stresses; Thermoelasticity; X-ray lithography;
Conference_Titel :
Semiconductor Modeling & Simulation, 1993. SMS Technical Digest. 1993 Symposium on
Conference_Location :
Taipei, Taiwan
Print_ISBN :
0-7803-1225-2
DOI :
10.1109/SMS.1993.664576