• DocumentCode
    1902918
  • Title

    High-repetition-rate, short-pulse generator using a planar CROSSATRON(R) switch

  • Author

    Santoru ; Goebel, D. ; Poeschel, R.

  • Author_Institution
    Hughes Res. Labs., Malibu, CA, USA
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    259
  • Abstract
    Summary form only given. We have developed a high-repetition-rate, high-voltage short-pulse generator that employs a new planar CROSSATRON(R) switch to discharge a low-inductance capacitor array into a load. Typical pulse parameters are 20-kV capacitor-charge voltage, 50-ns pulse width, 20-40-ns pulse risetime, and up to 120-kHz pulse-repetition rate in bursts of ten pulses. The burst length is limited by the capacitor charging power supply, not the intrinsic characteristics of the tube. High-repetition rate operation is enabled by a new planar CROSSATRON switch that uses a flat cathode, anode and grids, rather than the cylindrical electrode geometry used in other CROSSATRONs. CROSSATRON switches are plasma-discharge devices that conduct high current with low forward-voltage drop at high speeds. CROSSATRON switches also feature rapid recovery times that permit operation at high pulse-repetition frequencies. In fact, when configured in closing-only applications, as in the short-pulse generator, a maximum closing rate of di/dt=10/sup 11/ A/s can be obtained with voltage recovery times of <100 /spl mu/s.
  • Keywords
    plasma devices; plasma switches; switches; anode; cylindrical electrode geometry; flat cathode; high-repetition rate operation; high-repetition-rate high-voltage short-pulse generator; high-repetition-rate short-pulse generator; intrinsic tube characteristics; low forward-voltage drop; low-inductance capacitor array; planar CROSSATRON(R) switch; plasma-discharge devices; Anodes; Cathodes; Electrodes; Geometry; Power capacitors; Power supplies; Pulsed power supplies; Space vector pulse width modulation; Switches; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.605022
  • Filename
    605022