DocumentCode :
1902918
Title :
High-repetition-rate, short-pulse generator using a planar CROSSATRON(R) switch
Author :
Santoru ; Goebel, D. ; Poeschel, R.
Author_Institution :
Hughes Res. Labs., Malibu, CA, USA
fYear :
1997
fDate :
19-22 May 1997
Firstpage :
259
Abstract :
Summary form only given. We have developed a high-repetition-rate, high-voltage short-pulse generator that employs a new planar CROSSATRON(R) switch to discharge a low-inductance capacitor array into a load. Typical pulse parameters are 20-kV capacitor-charge voltage, 50-ns pulse width, 20-40-ns pulse risetime, and up to 120-kHz pulse-repetition rate in bursts of ten pulses. The burst length is limited by the capacitor charging power supply, not the intrinsic characteristics of the tube. High-repetition rate operation is enabled by a new planar CROSSATRON switch that uses a flat cathode, anode and grids, rather than the cylindrical electrode geometry used in other CROSSATRONs. CROSSATRON switches are plasma-discharge devices that conduct high current with low forward-voltage drop at high speeds. CROSSATRON switches also feature rapid recovery times that permit operation at high pulse-repetition frequencies. In fact, when configured in closing-only applications, as in the short-pulse generator, a maximum closing rate of di/dt=10/sup 11/ A/s can be obtained with voltage recovery times of <100 /spl mu/s.
Keywords :
plasma devices; plasma switches; switches; anode; cylindrical electrode geometry; flat cathode; high-repetition rate operation; high-repetition-rate high-voltage short-pulse generator; high-repetition-rate short-pulse generator; intrinsic tube characteristics; low forward-voltage drop; low-inductance capacitor array; planar CROSSATRON(R) switch; plasma-discharge devices; Anodes; Cathodes; Electrodes; Geometry; Power capacitors; Power supplies; Pulsed power supplies; Space vector pulse width modulation; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3990-8
Type :
conf
DOI :
10.1109/PLASMA.1997.605022
Filename :
605022
Link To Document :
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