Title :
Ge-on-Si pin-photodiodes for vertical and in-plane detection of 1300 to 1580 nm light
Author :
Jutzi, M. ; Berroth, M. ; Wöhl, G. ; Oehme, M. ; Stefani, V. ; Kasper, E.
Author_Institution :
Inst. of Electr. & Opt. Commun. Eng., Stuttgart Univ., Germany
Abstract :
Ge-on-Si pin-photodiodes for vertical and in-plane detection are presented. The devices are grown on an 31 nm ultrathin, strain relaxed buffer (SRB) layer. The vertical photodiode exhibits a zero-bias responsivity of 117 mA/W and a bandwidth of 1.5 GHz at a wavelength of 1298 nm. In comparison, the detector for in-plane detection has a zero-bias responsivity of 70 mA/W and a bandwidth of 4.4 GHz. For a bias voltage of -2 V a bandwidth of 6.2 GHz has been measured. At 1580 nm the photo responsivity of the lateral photodiode is higher (26 mA/W) than of the vertical photodiode (19 mA/W). The dislocation density probably may limit the bandwidth.
Keywords :
dark conductivity; dislocation density; elemental semiconductors; germanium; infrared detectors; p-i-n photodiodes; -2 V; 1.5 GHz; 1298 nm; 1300 to 1580 nm; 31 nm; 4.4 GHz; 6.2 GHz; Ge-Si; IR photodiode; bandwidth limiting dislocation density; bias voltage; dark current; in-plane light detection; lateral photodiode photoresponsivity; photodiode bandwidth; pin-photodiodes; ultrathin strain relaxed buffer layer; vertical light detection; vertical photodiode zero-bias responsivity; Absorption; Bandwidth; Capacitive sensors; Detectors; Diodes; Etching; Lattices; Photodetectors; Photodiodes; Substrates;
Conference_Titel :
Solid-State Device Research conference, 2004. ESSDERC 2004. Proceeding of the 34th European
Print_ISBN :
0-7803-8478-4
DOI :
10.1109/ESSDER.2004.1356560