DocumentCode :
1903469
Title :
Optimization of Beamline Optics for Synchrotron-Based X-Ray Lithography
Author :
Li, D.C. ; Lin, J.Y. ; Wang, G.W. ; Sun, C.Y.
Author_Institution :
Department of Electrical Engineering, Chung Cheng Institute of Technology, Taiwan
fYear :
1993
fDate :
6-7 March 1993
Firstpage :
105
Lastpage :
106
Keywords :
Educational institutions; Mirrors; Optical beams; Optical filters; Sun; Synchrotron radiation; Throughput; Ultra large scale integration; Vacuum systems; X-ray lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Modeling & Simulation, 1993. SMS Technical Digest. 1993 Symposium on
Conference_Location :
Taipei, Taiwan
Print_ISBN :
0-7803-1225-2
Type :
conf
DOI :
10.1109/SMS.1993.664578
Filename :
664578
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1903469
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