• DocumentCode
    1904032
  • Title

    Ultra High Density HfO2 Nanodots Memory for Scaling

  • Author

    Wakai, H. ; Kobayashi, M. ; Kumise, T. ; Yamaguchi, M. ; Nakanishi, T. ; Tanaka, H.

  • fYear
    2006
  • fDate
    2006
  • Firstpage
    58
  • Lastpage
    59
  • Keywords
    Amorphous materials; Channel bank filters; Chemical vapor deposition; Crystallization; Hafnium oxide; Rapid thermal annealing; Semiconductor films; Temperature; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Semiconductor Memory Workshop, 2006. IEEE NVSMW 2006. 21st
  • Conference_Location
    Monterey, CA, USA
  • Print_ISBN
    1-4244-0027-9
  • Type

    conf

  • DOI
    10.1109/.2006.1629493
  • Filename
    1629493
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1904032