• DocumentCode
    1904198
  • Title

    SiGe heterojunctions: devices and applications

  • Author

    Arienzo, Maurizio ; Comfort, Janies H. ; Crabbe, Emmanuel F. ; Harame, David L. ; Iyer, Subramanian S. ; Kesan, Vijay P. ; Meyerson, Bernard S. ; Patton, Gary I. ; Stark, Johannes M.C. ; Sun, Yuan-Chen

  • Author_Institution
    IBM Research Divison, Thomas J. Watson Research Center, P.O. Box 218, Yorktown, Heights, New York 10598
  • fYear
    1992
  • fDate
    14-17 Sept. 1992
  • Firstpage
    519
  • Lastpage
    527
  • Abstract
    SiGe alloys have been successfully to a number of semiconductor devices, including bipolar heterojunction transistors, field effect transistors (FET´s), tunneing and optoelectronic devices and structures. This review paper will first summarize the results obtained to-date in bipolar transistors, highlighting the design flexibility and the trade-offs offered by SiGe heterojunction technology an bandgap engineering, like junction field/capacitance control, liquid nitrogen operation and complementary processes. The leverage of this technology in high speed circuits will be discussed, including the record 75 GHz fT and 53 GHz fmax heterojunction bipolar transistors, and the achievement of sub-25 ps ECL ring oscillator delay. The applications of this technology to field effect transistors, to increase the channel mobility, to resonant tunneling structures, and to detectors and waveguides, to extend the use of silicon technology in optoelectronic are also reviewed.
  • Keywords
    Bipolar transistors; Design engineering; FETs; Germanium silicon alloys; Heterojunction bipolar transistors; Optoelectronic devices; Paper technology; Photonic band gap; Semiconductor devices; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    0444894780
  • Type

    conf

  • Filename
    5435152