DocumentCode :
1904198
Title :
SiGe heterojunctions: devices and applications
Author :
Arienzo, Maurizio ; Comfort, Janies H. ; Crabbe, Emmanuel F. ; Harame, David L. ; Iyer, Subramanian S. ; Kesan, Vijay P. ; Meyerson, Bernard S. ; Patton, Gary I. ; Stark, Johannes M.C. ; Sun, Yuan-Chen
Author_Institution :
IBM Research Divison, Thomas J. Watson Research Center, P.O. Box 218, Yorktown, Heights, New York 10598
fYear :
1992
fDate :
14-17 Sept. 1992
Firstpage :
519
Lastpage :
527
Abstract :
SiGe alloys have been successfully to a number of semiconductor devices, including bipolar heterojunction transistors, field effect transistors (FET´s), tunneing and optoelectronic devices and structures. This review paper will first summarize the results obtained to-date in bipolar transistors, highlighting the design flexibility and the trade-offs offered by SiGe heterojunction technology an bandgap engineering, like junction field/capacitance control, liquid nitrogen operation and complementary processes. The leverage of this technology in high speed circuits will be discussed, including the record 75 GHz fT and 53 GHz fmax heterojunction bipolar transistors, and the achievement of sub-25 ps ECL ring oscillator delay. The applications of this technology to field effect transistors, to increase the channel mobility, to resonant tunneling structures, and to detectors and waveguides, to extend the use of silicon technology in optoelectronic are also reviewed.
Keywords :
Bipolar transistors; Design engineering; FETs; Germanium silicon alloys; Heterojunction bipolar transistors; Optoelectronic devices; Paper technology; Photonic band gap; Semiconductor devices; Silicon germanium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
Conference_Location :
Leuven, Belgium
Print_ISBN :
0444894780
Type :
conf
Filename :
5435152
Link To Document :
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