DocumentCode
1904198
Title
SiGe heterojunctions: devices and applications
Author
Arienzo, Maurizio ; Comfort, Janies H. ; Crabbe, Emmanuel F. ; Harame, David L. ; Iyer, Subramanian S. ; Kesan, Vijay P. ; Meyerson, Bernard S. ; Patton, Gary I. ; Stark, Johannes M.C. ; Sun, Yuan-Chen
Author_Institution
IBM Research Divison, Thomas J. Watson Research Center, P.O. Box 218, Yorktown, Heights, New York 10598
fYear
1992
fDate
14-17 Sept. 1992
Firstpage
519
Lastpage
527
Abstract
SiGe alloys have been successfully to a number of semiconductor devices, including bipolar heterojunction transistors, field effect transistors (FET´s), tunneing and optoelectronic devices and structures. This review paper will first summarize the results obtained to-date in bipolar transistors, highlighting the design flexibility and the trade-offs offered by SiGe heterojunction technology an bandgap engineering, like junction field/capacitance control, liquid nitrogen operation and complementary processes. The leverage of this technology in high speed circuits will be discussed, including the record 75 GHz fT and 53 GHz fmax heterojunction bipolar transistors, and the achievement of sub-25 ps ECL ring oscillator delay. The applications of this technology to field effect transistors, to increase the channel mobility, to resonant tunneling structures, and to detectors and waveguides, to extend the use of silicon technology in optoelectronic are also reviewed.
Keywords
Bipolar transistors; Design engineering; FETs; Germanium silicon alloys; Heterojunction bipolar transistors; Optoelectronic devices; Paper technology; Photonic band gap; Semiconductor devices; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
Conference_Location
Leuven, Belgium
Print_ISBN
0444894780
Type
conf
Filename
5435152
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