• DocumentCode
    1904815
  • Title

    An inverse pinch plasma source for opening switches

  • Author

    Moschella, J.J. ; Yadlowsky, E.J. ; Hazelton, R.C.

  • Author_Institution
    HY-Tech Res. Corp., Radford, VA, USA
  • fYear
    1997
  • fDate
    19-22 May 1997
  • Firstpage
    262
  • Abstract
    Summary form only given. An inverse pinch plasma device is being developed for plasma opening switch applications. The physical principles behind its operation are essentially the same as the coaxial plasma gun except the inverse pinch utilizes an axial current sheet that expands and ejects plasma radially. It is therefore ideally suited for placement inside the center conductor of a cylindrically symmetric opening switch and has the potential of filling the switch region uniformly with plasma from a single source. Our source has been designed to operate inside a vacuum where a fast puff valve coupled with an annular nozzle injects a suitable amount of gas between two, concentric, disc shaped electrodes supported by a 1 inch diameter insulating quartz sleeve. Upon application of a high voltage pulse (20 kV), a cylindrical current sheet is formed near the insulator that expands radially due to magnetic pressure creating a snowplow front. Plasma is ejected from the device when the front reaches the end of the disc. This device can produce a range of plasma mass densities that extends over two orders of magnitude. Mass density control is exercised by varying the type of gas and the magnitude of the gas puff. We will present time resolved radial and axial plasma density profiles in a POS gap for H, Ne, and Ar plasmas as well as measurements of the average ionization state in the Ne and Ar plasmas.
  • Keywords
    argon; hydrogen; ionisation; neon; plasma density; plasma devices; plasma production; plasma switches; switches; 1 in; 20 kV; Ar; H; Ne; annular nozzle; average ionization state; axial current sheet; cylindrically symmetric opening switch; disc shaped electrodes; fast puff valve; inverse pinch plasma device; inverse pinch plasma source; mass density control; opening switches; plasma density profiles; plasma mass densities; plasma opening switch applications; snowplow front; Argon; Coaxial components; Conductors; Filling; Plasma applications; Plasma density; Plasma devices; Plasma measurements; Plasma sources; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.605030
  • Filename
    605030