• DocumentCode
    1907261
  • Title

    Measurement of field emission characteristics from transition metal nitride and carbide thin films

  • Author

    Gotoh, Y. ; Liao, M.Y. ; Tsuji, H. ; Ishikawa, J.

  • Author_Institution
    Dept. of Electron. Sci. & Eng., Kyoto Univ., Japan
  • fYear
    2003
  • fDate
    7-11 July 2003
  • Firstpage
    35
  • Lastpage
    36
  • Abstract
    In this paper, we report the measurements of the field emission characteristics from these materials.
  • Keywords
    chromium compounds; field emission; hafnium compounds; sputtered coatings; thin films; vanadium compounds; CrC; HfN; Si; VC; carbide thin films; field emission characteristics; transition metal nitride; Cathodes; Cyclic redundancy check; Fluctuations; Ion beams; Magnetic field measurement; Niobium compounds; Sputtering; Substrates; Transistors; Virtual colonoscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-8181-9515-4
  • Type

    conf

  • DOI
    10.1109/IVMC.2003.1222970
  • Filename
    1222970
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1907261