Title :
Breakdown predictions of microstrip interconnects and coplanar waveguide-built devices in the presence of HP-EMPs
Author :
Yin, Wen-Yan ; Dong, X.T. ; Mao, Junfa ; Li, Le-Wei
Author_Institution :
Dept. of Electron. Eng., Shanghi Jiao Tong Univ., Shanghai
fDate :
Feb. 27 2006-March 3 2006
Abstract :
Electrical breakdown of microstrip interconnects and coplanar waveguide-built devices in the presence of high-power electromagnetic pulses (HP-EMP) is addressed in this paper, and some effective methodologies are outlined and proposed for fast predicting maximum current carrying density of bonding wire, electric field breakdown strength of thin film capacitors, average and peak power handling capabilities of conventional and thin film microstrip and coplanar waveguides. An efficient FDTD procedure is also presented for characterizing electric breakdown strength of the substrate dielectrics based on their high-field conduction models
Keywords :
coplanar waveguide components; electromagnetic pulse; finite difference time-domain analysis; microstrip components; thin film devices; FDTD; bonding wire; breakdown predictions; coplanar waveguide-built devices; electric field breakdown; electrical breakdown; high-field conduction models; high-power electromagnetic pulses; microstrip interconnects; substrate dielectrics; thin film capacitors; thin film microstrip; Coplanar waveguides; Dielectric substrates; Dielectric thin films; Electric breakdown; Electromagnetic devices; Electromagnetic fields; Electromagnetic scattering; Electromagnetic waveguides; Microstrip; Thin film devices;
Conference_Titel :
Electromagnetic Compatibility, 2006. EMC-Zurich 2006. 17th International Zurich Symposium on
Conference_Location :
Singapore
Print_ISBN :
3-9522990-3-0
DOI :
10.1109/EMCZUR.2006.214967