Title :
Rapid Thermal Processing and Thin Film Technologies
Author_Institution :
Interuniversity Microelectronics Center (IMEC v.z.w.), Kapeldreef 75, 3001 Leuven, Belgium
Abstract :
Over the last few years, there is an increasing interest in Rapid Thermal Processing for many applications in Si technology. Major issues like temperature control and uniformity as well as gas control have been improved. Moreover, with the introduction of single wafer cluster tools, rapid thermal processes become more important in various technological steps.
Keywords :
Cleaning; Dielectric thin films; Microelectronics; Pollution measurement; Rapid thermal processing; Silicidation; Temperature control; Temperature measurement; Thermal engineering; Transistors;
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
