Title :
SiON-Au Double Layer Microactuator Fabrication
Author :
Dong, Q. ; Benecke, W. ; Schliwinski, H.
Author_Institution :
Fraunhofer-Institut fÿr Microstrukturtechnik, Dillenburger Str. 53, 1000 Berlin 33, Germany
Keywords :
Dry etching; Fabrication; Gold; Microactuators; Optical films; Plasma measurements; Resistors; Semiconductor films; Silicon; Tensile stress;
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
