DocumentCode
1907891
Title
Thermal microtransducers by CMOS technology combined with micromachining
Author
Baltes, H. ; Moser, D. ; Lenggenhager, R. ; Brand, O.
Author_Institution
Physical Electronics Laboratory, ETH Zurich, CH-8093 Zurich, Switzerland
fYear
1991
fDate
16-19 Sept. 1991
Firstpage
419
Lastpage
422
Abstract
We report the design, fabrication and characterization of thermomechanical microtransducers realized by industrial IC CMOS technology combined with subsequent maskless anisotropic wet etching. Examples include a thermally excited beam resonator, resistive and thermoelectric gas flow sensors, and a thermoelectric power sensor.
Keywords
CMOS integrated circuits; CMOS technology; Fabrication; Gas detectors; Micromachining; Sensor phenomena and characterization; Textile industry; Thermal sensors; Thermoelectricity; Thermomechanical processes;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location
Montreux, Switzerland
Print_ISBN
0444890661
Type
conf
Filename
5435300
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