• DocumentCode
    1907951
  • Title

    Optimisation of silicon fed fabrication for space application

  • Author

    Wang, L. ; Stevens, R. ; Huq, S.E. ; Loader, I. ; Kent, B.J. ; Aplin, K.L. ; She, J.C.

  • Author_Institution
    Central Microstructure Facility, Rutherford Appleton Lab., Didcot, UK
  • fYear
    2003
  • fDate
    7-11 July 2003
  • Firstpage
    83
  • Lastpage
    84
  • Abstract
    This paper focuses on the design issues and process calibrations of the fabrication of a silicon field emission device on N type 100-mm diameter silicon wafer.
  • Keywords
    electron field emission; elemental semiconductors; field emitter arrays; silicon; sputtered coatings; 100 mm; AlN; Si; design issues; process calibration; silicon FED fabrication; silicon field emission device; silicon wafer; space application; Dry etching; Fabrication; Laboratories; Rough surfaces; Silicon; Space technology; Surface roughness; Testing; Voltage; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-8181-9515-4
  • Type

    conf

  • DOI
    10.1109/IVMC.2003.1222994
  • Filename
    1222994
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1907951