• DocumentCode
    1908267
  • Title

    Control of dopant-induced quantum dots by channel geometry

  • Author

    Moraru, Daniel ; Nakamura, Ryusuke ; Miki, Sakito ; Mizuno, Takeshi ; Tabe, Michiharu

  • Author_Institution
    Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
  • fYear
    2010
  • fDate
    13-14 June 2010
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    As device dimensions are continuously scaled down, the discreteness of dopant distribution has a significant effect on conventional device operation and controllability. This paper will show that the structure of dopant-induced quantum dot array can be controlled in nanoscale SOI-FETs containing a large number of dopants by the channel geometry. It is also shown that single electron transport through discrete dopants can be realized by controlling the channel geometry and utilizing the favorable effect of a statistical number of dopants. This may allow control for new applications such as dopant-based turnstiles.
  • Keywords
    doping profiles; elemental semiconductors; field effect transistors; nanoelectronics; phosphorus; semiconductor quantum dots; silicon; silicon-on-insulator; single electron transistors; Si:P; channel geometry; device operation; dopant distribution; dopant-induced quantum dots; nanoscale SOI-FET; single electron transport; Arrays; Electric potential; FETs; Geometry; Logic gates; Nanoscale devices; Voltage measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Silicon Nanoelectronics Workshop (SNW), 2010
  • Conference_Location
    Honolulu, HI
  • Print_ISBN
    978-1-4244-7727-2
  • Electronic_ISBN
    978-1-4244-7726-5
  • Type

    conf

  • DOI
    10.1109/SNW.2010.5562584
  • Filename
    5562584