Title : 
Control of dopant-induced quantum dots by channel geometry
         
        
            Author : 
Moraru, Daniel ; Nakamura, Ryusuke ; Miki, Sakito ; Mizuno, Takeshi ; Tabe, Michiharu
         
        
            Author_Institution : 
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
         
        
        
        
        
        
            Abstract : 
As device dimensions are continuously scaled down, the discreteness of dopant distribution has a significant effect on conventional device operation and controllability. This paper will show that the structure of dopant-induced quantum dot array can be controlled in nanoscale SOI-FETs containing a large number of dopants by the channel geometry. It is also shown that single electron transport through discrete dopants can be realized by controlling the channel geometry and utilizing the favorable effect of a statistical number of dopants. This may allow control for new applications such as dopant-based turnstiles.
         
        
            Keywords : 
doping profiles; elemental semiconductors; field effect transistors; nanoelectronics; phosphorus; semiconductor quantum dots; silicon; silicon-on-insulator; single electron transistors; Si:P; channel geometry; device operation; dopant distribution; dopant-induced quantum dots; nanoscale SOI-FET; single electron transport; Arrays; Electric potential; FETs; Geometry; Logic gates; Nanoscale devices; Voltage measurement;
         
        
        
        
            Conference_Titel : 
Silicon Nanoelectronics Workshop (SNW), 2010
         
        
            Conference_Location : 
Honolulu, HI
         
        
            Print_ISBN : 
978-1-4244-7727-2
         
        
            Electronic_ISBN : 
978-1-4244-7726-5
         
        
        
            DOI : 
10.1109/SNW.2010.5562584