DocumentCode
1908267
Title
Control of dopant-induced quantum dots by channel geometry
Author
Moraru, Daniel ; Nakamura, Ryusuke ; Miki, Sakito ; Mizuno, Takeshi ; Tabe, Michiharu
Author_Institution
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
fYear
2010
fDate
13-14 June 2010
Firstpage
1
Lastpage
2
Abstract
As device dimensions are continuously scaled down, the discreteness of dopant distribution has a significant effect on conventional device operation and controllability. This paper will show that the structure of dopant-induced quantum dot array can be controlled in nanoscale SOI-FETs containing a large number of dopants by the channel geometry. It is also shown that single electron transport through discrete dopants can be realized by controlling the channel geometry and utilizing the favorable effect of a statistical number of dopants. This may allow control for new applications such as dopant-based turnstiles.
Keywords
doping profiles; elemental semiconductors; field effect transistors; nanoelectronics; phosphorus; semiconductor quantum dots; silicon; silicon-on-insulator; single electron transistors; Si:P; channel geometry; device operation; dopant distribution; dopant-induced quantum dots; nanoscale SOI-FET; single electron transport; Arrays; Electric potential; FETs; Geometry; Logic gates; Nanoscale devices; Voltage measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Silicon Nanoelectronics Workshop (SNW), 2010
Conference_Location
Honolulu, HI
Print_ISBN
978-1-4244-7727-2
Electronic_ISBN
978-1-4244-7726-5
Type
conf
DOI
10.1109/SNW.2010.5562584
Filename
5562584
Link To Document