DocumentCode :
1908589
Title :
A low power 52.9 GHz static divider implemented in a manufacturable 180 GHz AlInAs/InGaAs HBT IC technology
Author :
Sokolich, M. ; Docter, D.P. ; Brown, Y.K. ; Kramer, A.R. ; Jensen, J.F. ; Stanchina, W.E. ; Thomas, S., III ; Fields, C.H. ; Ahmari, D.A. ; Lui, M. ; Martinez, R. ; Duvall, J.
Author_Institution :
HRL Labs., Malibu, CA, USA
fYear :
1998
fDate :
1-4 Nov. 1998
Firstpage :
117
Lastpage :
120
Abstract :
We have demonstrated a 52.9 GHz static 1/8 divider in an AlInAs/InGaAs HBT technology. To our knowledge this is the fastest static divider reported in any semiconductor technology. The divider was realized in a high yield optical lithography triple mesa HBT process. At maximum speed, power consumption was 40 mW/flip-flop. A second 1/8 divider, designed for lower power but using the same size transistors, consumed 8.6 mW/flip-flop at 35 GHz. Sensitivity was excellent with the high-speed version operating from DC to 48 GHz with less than 0 dBm input power. Uniformity and reproducibility were also demonstrated; all functional dividers operated above 45 GHz on-wafer and the extrapolated yield of dividers indicates that the process is capable of supporting 500-1000 transistor designs. Circuit performance was relatively insensitive to the details of the device epitaxial structure indicating a highly robust and manufacturable process.
Keywords :
III-V semiconductors; aluminium compounds; bipolar digital integrated circuits; flip-flops; frequency dividers; gallium arsenide; heterojunction bipolar transistors; high-speed integrated circuits; indium compounds; integrated circuit technology; low-power electronics; photolithography; 0 to 48 GHz; 180 GHz; 360 mW; 52.9 GHz; AlInAs-InGaAs; epitaxial structure; high yield HBT process; low power static divider; manufacturable IC technology; optical lithography process; static 1/8 divider; triple mesa HBT process; Energy consumption; Flip-flops; Heterojunction bipolar transistors; High speed optical techniques; Indium gallium arsenide; Lithography; Manufacturing; Optical sensors; Reproducibility of results; Semiconductor device manufacture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1998. Technical Digest 1998., 20th Annual
Conference_Location :
Atlanta, GA, USA
ISSN :
1064-7775
Print_ISBN :
0-7803-5049-9
Type :
conf
DOI :
10.1109/GAAS.1998.722642
Filename :
722642
Link To Document :
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