Title :
Passive and active probe arrays for dip-pen nanolithography
Author :
Ming Zhang ; Bullen, D. ; Ryu, Kwang Sun ; Chang Liu
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL
Abstract :
The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100 nm patterns in a high speed, parallel, and controllable fashion
Keywords :
atomic force microscopy; lithography; micromachining; nanotechnology; 100 nm; MEMS micromachining technique; active probe array; atomic force microscope; dip-pen nanolithography; passive probe array; Atomic force microscopy; Electron optics; High speed optical techniques; Lithography; Nanolithography; Optical sensors; Particle beam optics; Probes; Throughput; Ultraviolet sources;
Conference_Titel :
Nanotechnology, 2001. IEEE-NANO 2001. Proceedings of the 2001 1st IEEE Conference on
Conference_Location :
Maui, HI
Print_ISBN :
0-7803-7215-8
DOI :
10.1109/NANO.2001.966387
