DocumentCode :
1908748
Title :
1D Modeling of SOI MOSFETs Using Distinct Quasi-Fermi Potentials
Author :
Schubert, M. ; Höfflinger, B. ; Schroeder, D. ; Zingg, R.P.
Author_Institution :
Institute for Microelectronics Stuttgart, Allmandring 30, D-7000 Stuttgart 80
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
237
Lastpage :
240
Abstract :
Distinct electron and hole quasi-Fermi potentials, ¿fn, and ¿fp, are included into a one-dimensional SOI MOSFET model that accounts for finite inversion and depletion layer thicknesses. The inclusion of ¿fn, ¿fp, in the nonlinear analytical model is demonstrated to describe phenomena like kink effect and the multistable-charge-controlled-memory effect (MCCM) in SOI MOSFETs. The calculation of ¿fp(t) depends on the device history and generation/recombination rates.
Keywords :
Analytical models; Charge carrier processes; History; MOSFETs; Microelectronics; Semiconductor films; Semiconductor process modeling; Silicon; Spontaneous emission; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5435334
Link To Document :
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