Title :
Study of pocket implant parameters for 0,18 um CMOS
Author :
Schmitz, J. ; Ponomarev, Y.V. ; Montree, A.H. ; Woerlee, P.H.
Author_Institution :
Philips Research Laboratories,The Netherlands
fDate :
22-24 September 1997
Keywords :
Electron beams; Etching; Implants; Intrusion detection; Length measurement; Lithography; MOS devices; MOSFETs; Scanning electron microscopy; Transistors;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194406
