DocumentCode :
1909050
Title :
Fabrication of low gate current triode field emitters with planar carbon nanoparticle cathodes
Author :
Woo Jong Seo ; Seungho Choi ; Soonil Lee ; Koh, K.H.
Author_Institution :
Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon, South Korea
fYear :
2003
fDate :
7-11 July 2003
Firstpage :
165
Lastpage :
166
Abstract :
We modified the structure of the triode field emitters with planar carbon nanoparticle cathodes to reduce the gate currents. As it turned out a simple insertion of an extra metal layer between the gate insulator and the cathode layer was sufficient for the substantial reduction of gate currents; the gate currents of the triode emitter with the modified structure never exceeded 4% of the anode currents up to the anode currents of /spl sim/250 nA corresponding to the gate voltage of 67 V and the anode voltage 900 V. The fabrication of the modified triode structure required only two extra processing steps together with the conventional photolithography. We were able to account for the gate-current reduction in terms of the modification in the electric field distribution.
Keywords :
carbon; cathodes; electron field emission; etching; nanoparticles; nanotechnology; photolithography; sputter deposition; triodes; 250 nA; 67 V; 900 V; C; cathode layer; electric field; gate current triode field emitters; gate insulator; metal layer; photolithography; planar carbon nanoparticle cathodes; Anodes; Carbon dioxide; Cathodes; Electron emission; Fabrication; Insulation; Lithography; Metal-insulator structures; Sputtering; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
Type :
conf
DOI :
10.1109/IVMC.2003.1223035
Filename :
1223035
Link To Document :
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