Title :
An Improved Technology for Elevated Source/Drain MOSFETS
Author :
Waite, A.M. ; Howard, D.J. ; Kubicek, S. ; Caymax, M. ; De Meyer, K. ; Evans, A.G.R.
Author_Institution :
University of Southampton, UK
fDate :
22-24 September 1997
Keywords :
CMOS process; CMOS technology; Dry etching; Epitaxial growth; Implants; MOSFETs; Manufacturing processes; Silicon; Space technology; Thermal resistance;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194414
