Title : 
Field emission from tetrahedral amorphous carbon films grown using a trigger less pulsed cathodic arc process
         
        
            Author : 
Satyanarayana, B.S. ; Panwar, O.S. ; Khan, A.
         
        
            Author_Institution : 
Rodel Nitta Co., Nara, Japan
         
        
        
        
        
        
            Abstract : 
In this paper, we report field emission from nitrogen incorporated and as grown ta-C films grown using a pulsed trigger less unfiltered cathodic arc process. The process offers the advantage of growing ta-C films with relatively less stress, higher thickness, much lower macro particles and repeatable properties. This makes the ta-C material grown using the trigger less pulsed unfiltered arc very attractive for the field emission applications.
         
        
            Keywords : 
amorphous state; carbon; field emission; nitrogen; thin films; C-N; film thickness; macroparticles; stress; tetrahedral amorphous carbon films; trigger less pulsed cathodic arc process; Amorphous materials; Carbon dioxide; Electron emission; Micromechanical devices; Nitrogen; Optical pulses; Pulsed laser deposition; Semiconductor films; Silicon; Stress;
         
        
        
        
            Conference_Titel : 
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
         
        
            Conference_Location : 
Osaka, Japan
         
        
            Print_ISBN : 
4-8181-9515-4
         
        
        
            DOI : 
10.1109/IVMC.2003.1223039