DocumentCode :
1909195
Title :
Field emission from tetrahedral amorphous carbon films grown using a trigger less pulsed cathodic arc process
Author :
Satyanarayana, B.S. ; Panwar, O.S. ; Khan, A.
Author_Institution :
Rodel Nitta Co., Nara, Japan
fYear :
2003
fDate :
7-11 July 2003
Firstpage :
173
Lastpage :
174
Abstract :
In this paper, we report field emission from nitrogen incorporated and as grown ta-C films grown using a pulsed trigger less unfiltered cathodic arc process. The process offers the advantage of growing ta-C films with relatively less stress, higher thickness, much lower macro particles and repeatable properties. This makes the ta-C material grown using the trigger less pulsed unfiltered arc very attractive for the field emission applications.
Keywords :
amorphous state; carbon; field emission; nitrogen; thin films; C-N; film thickness; macroparticles; stress; tetrahedral amorphous carbon films; trigger less pulsed cathodic arc process; Amorphous materials; Carbon dioxide; Electron emission; Micromechanical devices; Nitrogen; Optical pulses; Pulsed laser deposition; Semiconductor films; Silicon; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
Type :
conf
DOI :
10.1109/IVMC.2003.1223039
Filename :
1223039
Link To Document :
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