DocumentCode
1909841
Title
Fabrication of carbon nanotubes array and its field emission property
Author
Sato, H. ; Takegawa, H. ; Saito, Y. ; Yamaji, H. ; Miyake, H. ; Hiramatsu, K.
Author_Institution
Dept. of Electr. & Electron. Eng., Mie Univ., Tsu, Japan
fYear
2003
fDate
7-11 July 2003
Firstpage
219
Lastpage
220
Abstract
In this paper, we employed the PE-CVD and a lift-off process using silicon substrates. Field emission from the CNT array, which was fabricated by means of this technique, was investigated.
Keywords
carbon nanotubes; field emitter arrays; nanotechnology; nanotube devices; plasma CVD; C; Si; carbon nanotubes array; field emission; plasma enhanced CVD; silicon substrates; Carbon nanotubes; Fabrication; Field emitter arrays; Iron; Plasma chemistry; Plasma displays; Plasma properties; Silicon; Substrates; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location
Osaka, Japan
Print_ISBN
4-8181-9515-4
Type
conf
DOI
10.1109/IVMC.2003.1223062
Filename
1223062
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