DocumentCode
1910189
Title
A High Performance 0.18 um CMOS Technology Designed for Manufacturability
Author
Badenes, Gonçal ; Hendriks, Marton ; Perelló, Carles ; Deferm, Ludo
Author_Institution
IMEC, Belgium
fYear
1997
fDate
22-24 September 1997
Firstpage
404
Lastpage
407
Keywords
Amorphous silicon; CMOS technology; Implants; Isolation technology; Leakage current; MOS devices; MOSFETs; Manufacturing; Semiconductor device manufacture; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN
2-86332-221-4
Type
conf
DOI
10.1109/ESSDERC.1997.194451
Filename
1503381
Link To Document