• DocumentCode
    1910189
  • Title

    A High Performance 0.18 um CMOS Technology Designed for Manufacturability

  • Author

    Badenes, Gonçal ; Hendriks, Marton ; Perelló, Carles ; Deferm, Ludo

  • Author_Institution
    IMEC, Belgium
  • fYear
    1997
  • fDate
    22-24 September 1997
  • Firstpage
    404
  • Lastpage
    407
  • Keywords
    Amorphous silicon; CMOS technology; Implants; Isolation technology; Leakage current; MOS devices; MOSFETs; Manufacturing; Semiconductor device manufacture; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1997. Proceeding of the 27th European
  • Print_ISBN
    2-86332-221-4
  • Type

    conf

  • DOI
    10.1109/ESSDERC.1997.194451
  • Filename
    1503381