Title :
A High Performance 0.18 um CMOS Technology Designed for Manufacturability
Author :
Badenes, Gonçal ; Hendriks, Marton ; Perelló, Carles ; Deferm, Ludo
Author_Institution :
IMEC, Belgium
fDate :
22-24 September 1997
Keywords :
Amorphous silicon; CMOS technology; Implants; Isolation technology; Leakage current; MOS devices; MOSFETs; Manufacturing; Semiconductor device manufacture; Threshold voltage;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194451
