• DocumentCode
    1910261
  • Title

    CMOS Production Compatible SiGe Heteroepitaxy for High Frequency Circuits

  • Author

    Ritter, G. ; Bolze, D. ; Fischer, G. ; Knoll, D. ; Schley, P. ; Tillack, B. ; Wolansky, D.

  • Author_Institution
    Institute for Semiconductor Physics, Germany
  • fYear
    1997
  • fDate
    22-24 September 1997
  • Firstpage
    424
  • Lastpage
    427
  • Keywords
    CMOS technology; Circuits; Electrical resistance measurement; Epitaxial growth; Frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Production; Semiconductor device measurement; Silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1997. Proceeding of the 27th European
  • Print_ISBN
    2-86332-221-4
  • Type

    conf

  • DOI
    10.1109/ESSDERC.1997.194456
  • Filename
    1503386
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1910261