Title :
Plasma etching treatment for improving the field emission properties of carbon nanotubes composite emitters
Author :
Hao Ren ; Deng, S.Z. ; Jun Chen ; She, J.C. ; Xu, N.S.
Author_Institution :
State Key Lab. of Optoelectron. Mater & Technol.., Sun Yat-Sen Univ., Guangzhou, China
Abstract :
In this report, we introduce an ion reactive plasma etching treatment to modify the field emission properties of screen-printed CNT thick film field emitters. The surface morphology was examined using scanning electron microscopy.
Keywords :
carbon nanotubes; field emission; nanocomposites; scanning electron microscopy; sputter etching; surface morphology; thin films; C; SEM; carbon nanotubes composite emitters; field emission; plasma etching; scanning electron microscopy; screen printed CNT thick film; surface morphology; Carbon nanotubes; Composite materials; Etching; Flat panel displays; Laboratories; Plasma applications; Plasma displays; Plasma properties; Scanning electron microscopy; Surface morphology;
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
DOI :
10.1109/IVMC.2003.1223083
