Title :
Source/Drain Engineering with Ge Large Angle Tilt Implantation and Pre-Amorphization to Improve Currrent Drive and Alleviate Floating Body Effects of Thin Film SOI MOSFETs
Author :
Hsiao, Tommy C. ; Liu, Ping ; Lynch, William T. ; Woo, Jason C S
Author_Institution :
dvancedMicro Devices Inc., USA
fDate :
22-24 September 1997
Keywords :
Etching; Length measurement; MOSFETs; Semiconductor thin films; Silicidation; Silicides; Silicon; Thin film devices; Transistors; Voltage measurement;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194479
