DocumentCode :
1911396
Title :
Optimization of the hard X-ray yield from a heterogeneous Z-pinch
Author :
Rudakov, L.I.
Author_Institution :
Kurchatov (I.V.) Inst. of Atomic Energy, Moscow, Russia
fYear :
1997
fDate :
19-22 May 1997
Firstpage :
274
Abstract :
Summary form only given. Conventional Z-pinches are known to be an effective source of soft X-rays. However, this approach has limited control in redistributing the radiation spectrum, specifically toward the hard X-Ray regime where photon energies are >10 keV. The generation of such energetic photons requires both high densities and temperatures in the plasma. Due to the Rayleigh-Taylor instability and current (mass) limitations, these plasma conditions are difficult to achieve simultaneously. To produce a harder emitted X-ray spectrum, the "Liner-Converter" scheme was proposed at the Kurchatov Institute. This technique uses the thermal flux from the end of a low-Z pinch to rapidly heat a thin, high-Z converter linked to the edge of the pinch. A temperature of 10 keV can be achieved in the converter by fast and efficient heat transfer from the low Z-pinch liner; this results from the strong dependence of thermal flux on electron temperature. Using a low-Z pinch liner minimizes radiation losses and instability growth, while maximizing end-losses to the converter. By employing a separate converter, there is flexibility in choice of materials and radiator geometry. Computer simulations of this concept and experiments on the 3 MA, S-300 generator will be presented.
Keywords :
X-ray production; Z pinch; plasma production; plasma shock waves; plasma simulation; 10 keV; 3 MA; Kurchatov Institute; Rayleigh-Taylor instability; S-300 generator; computer simulations; hard X-ray yield; heterogeneous Z-pinch; high density plasma; high temperature plasma; high-Z converter; instability growth; liner-converter scheme; low Z-pinch liner; low-Z pinch; radiation spectrum; Computer simulation; Electrons; Geometry; Heat transfer; Optical control; Plasma density; Plasma sources; Plasma temperature; Plasma x-ray sources; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3990-8
Type :
conf
DOI :
10.1109/PLASMA.1997.605056
Filename :
605056
Link To Document :
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