DocumentCode :
191169
Title :
Slow-wave distributed MEMS phase shifter in CMOS for millimeter-wave applications
Author :
Verona, B.M. ; Rehder, G.P. ; Serrano, A.L.C. ; Carreno, M.N.P. ; Ferrari, P.
Author_Institution :
Lab. of Microelectron., Univ. of Sao Paulo, Sao Paulo, Brazil
fYear :
2014
fDate :
6-9 Oct. 2014
Firstpage :
211
Lastpage :
214
Abstract :
This paper presents the first experimental results of a distributed-MEMS phase shifter for millimeter waves applications. It is based on a tunable shielded coplanar waveguide (S-CPW) fabricated using the back-end-of-line (BEOL) of AMS 0.35 μm CMOS technology. A simple maskless post-CMOS etch was used to remove the BEOL silicon dioxide and release the ribbons of the S-CPW that can be electrostatically displaced, changing the capacitance of the S-CPW, altering the phase of the propagating signal. A phase shift of 25.1° with an insertion loss of 0.7 dB was measured in an 1120 μm-long S-CPW at 60 GHz, under a 60 V bias voltage, resulting in a Figure of Merit of 36°/dB. The developed approach also leads to a small insertion loss variation of ±0.1 dB. These first results should be further improved by optimizing the mechanical design.
Keywords :
CMOS integrated circuits; coplanar waveguides; etching; millimetre wave integrated circuits; millimetre wave phase shifters; silicon compounds; SiO2; back-end-of-line; distributed MEMS phase shifter; figure of merit; frequency 60 GHz; insertion loss; loss 0.7 dB; maskless post-CMOS etch; millimeter-wave applications; shielded coplanar waveguide; size 0.35 mum; size 1120 mum; voltage 60 V; CMOS integrated circuits; CMOS technology; Coplanar waveguides; Insertion loss; Loss measurement; Micromechanical devices; Phase shifters; CMOS; MEMS; millimeter wave; phase shifter; slow-wave transmission lines;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (EuMC), 2014 44th European
Conference_Location :
Rome
Type :
conf
DOI :
10.1109/EuMC.2014.6986407
Filename :
6986407
Link To Document :
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