• DocumentCode
    1911824
  • Title

    Random Telegraph Signal related low-frequency noise peaks in submicrometer Si MOST´s

  • Author

    Simoen, E. ; Dierickx, B. ; Claeys, C.

  • Author_Institution
    IMEC, Leuven, Belgium
  • fYear
    1993
  • fDate
    13-16 Sept. 1993
  • Firstpage
    43
  • Lastpage
    46
  • Abstract
    This paper discusses die low-frequency noise behaviour corresponding to Random Telegraph Signals in submicrometer Si MOSTs. It is shown that when the noise spectral density is measured as a function of the gate voltage (linear operation) or of the drain voltage, peak-shaped features are generally obtained. This excess-noise peak can be used to identify the occurrence of RTS, for instance in Silicon-on-Insulator MOSTs, and is useful in extracting the RTS parameters, i.e. its capture and emission time constant and the amplitude.
  • Keywords
    MOSFET; elemental semiconductors; micrometry; semiconductor device noise; silicon; silicon-on-insulator; CMOS technology; RTS parameters; Si; drain voltage; excess-noise peak; gate voltage; low-frequency noise behaviour; metal-oxide-semiconductor transistor; noise spectral density measurement; peak-shaped feature; random telegraph signal; submicrometer MOST; CMOS technology; Density measurement; Frequency; Low-frequency noise; Noise level; Noise measurement; Physics; Silicon on insulator technology; Telegraphy; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
  • Conference_Location
    Grenoble
  • Print_ISBN
    2863321358
  • Type

    conf

  • Filename
    5435459