Title :
Equipment efficiency improvement: the new frontier
Author :
Leachman, Robert C. ; Busing, David P. ; Liu, Tmg-Yun ; Moore, David
Author_Institution :
California Univ., Berkeley, CA, USA
Abstract :
It has been determined from the Competitive Semiconductor Manufacturing (CSM) Survey that equipment throughput performance is highly divergent among competing fabs, and that even among leaders, there seems to be significant improvement potential. This paper first presents a summary of new research being done at the University of California at Berkeley to measure and monitor OEE and productivity losses. A summary of best practices from the CSM survey is then presented
Keywords :
cluster tools; critical path analysis; electronics industry; integrated circuit yield; process control; production control; semiconductor process modelling; OEE; best practices; cluster tools; competitive semiconductor manufacturing survey; equipment efficiency improvement; equipment throughput performance; factory scheduling; idle time; improvement potential; machine availability; on-line efficiency monitoring; process control; production planning; productivity losses; recipe overload; Best practices; Distortion measurement; Lead; Loss measurement; Monitoring; Productivity; Semiconductor device manufacture; Semiconductor process modeling; Throughput; Time measurement;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
DOI :
10.1109/ISSM.1997.664617
