DocumentCode :
1912019
Title :
Mechanisms of Hot-Carrier Degradation of Analog Device Parameters in n-MOSFETs
Author :
Thewes, Roland ; Weber, Werner ; Goser, Karl
fYear :
1993
fDate :
13-16 Sept. 1993
Firstpage :
85
Lastpage :
88
Abstract :
Hot-carrier (HC) degradation of analog operation parameters has been investigated by stressing LDD-n-MOSFETs with channel lengths of 1.0-5.0 μm. A model has been developed to clarify the different mechanisms leading to degradation of the differential drain output resistance. Experimental evidence is given to check the model. Finally, possible consequences in the circuit environment are discussed.
Keywords :
MOSFET; hot carriers; HC degradation; LDD-n-MOSFET; analog device operation parameter; differential drain output resistance; hot-carrier degradation; size 1.0 mum to 5.0 mum; Charge carrier processes; Circuit stability; Degradation; Electron traps; Hot carrier effects; Hot carriers; Interface states; Low voltage; MOSFET circuits; Stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
Conference_Location :
Grenoble
Print_ISBN :
2863321358
Type :
conf
Filename :
5435467
Link To Document :
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