• DocumentCode
    1912071
  • Title

    Linear approach in photo automation

  • Author

    Chen, Dale ; Tsai, Bob ; Chang, Thomas

  • Author_Institution
    Mosel Vitelic Inc., Hsinchu, Taiwan
  • fYear
    1998
  • fDate
    16-17 Jun 1998
  • Firstpage
    187
  • Lastpage
    192
  • Abstract
    If the photo engineer can´t estimate the ET value to run the wafers in a stepper, he has to guess an ET value for the test wafers to see whether the output CD will fall into the accepted area or not. It really will waste time and money. The production amount in fab is very important. The linear approach algorithm could be one of the solutions to take care of photo automation even if the algorithm in this paper might not support one hundred percent the predicted ET value or OSI overlay falling into the accepted area. Actually, this linear approach algorithm, through the implementation, has already reached some kind of level. We take more concern with this algorithm and hope to see it improve itself in the future
  • Keywords
    integrated circuit yield; photolithography; process control; ET value; IC yield; OSI overlay; linear approach algorithm; output CD; photo automation; stepper; Area measurement; Automation; Coatings; Fabrication; Inspection; Prediction algorithms; Preventive maintenance; Production equipment; Testing; Timing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Technology Workshop, 1998
  • Conference_Location
    Hsinchu
  • Print_ISBN
    0-7803-5179-7
  • Type

    conf

  • DOI
    10.1109/SMTW.1998.722700
  • Filename
    722700