Title :
Optimization of submicron microwave transistors by lateral scaling
Author :
Webster, M.N. ; Verbruggen, A.H. ; Jos, H.F.F. ; Romijn, J. ; Moors, P.M.A. ; Radelaar, S.
Author_Institution :
Delft Inst. voor Micro-Elektronica en Submicrontechnologie, Tech. Univ. Delft, Delft, Netherlands
Abstract :
Interdigitated microwave bipolar transistors with submicron dimensions have been manufactured to study the effects that occur when the emitter width is reduced to values well below one micron. The DC current gain normalized to the total emitter area shows an optimum as a function of emitter width for 0.5 μm wide emitters. The sidewalk of the emitters contribute significantly to the measured reverse biased emitter-base depletion layer capacitances. The maximum value of the transit-frequency fT at a given value of VCE does not significantly depend on the emitter width. The device with the smallest emitters had the lowest measured base resistance and, consequently, the highest maximum frequency of oscillation, fmax.
Keywords :
microwave bipolar transistors; optimisation; semiconductor device manufacture; DC current gain; base resistance measurement; emitter width; interdigitated submicron microwave bipolar transistor; lateral scaling; optimization; oscillation maximum frequency; reverse biased emitter-base depletion layer capacitance measurement; size 0.5 mum; transit-frequency maximum value; Area measurement; Bipolar transistors; Capacitance measurement; Current measurement; Electrical resistance measurement; Frequency measurement; Manufacturing; Microwave devices; Microwave transistors; Performance gain;
Conference_Titel :
Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
Conference_Location :
Grenoble