DocumentCode :
1912687
Title :
Copper metallization for submicron VLSI technology
Author :
Rathore, H.S.
Author_Institution :
IBM Microelectronics, United States
fYear :
1998
fDate :
8-10 Sept. 1998
Firstpage :
20
Lastpage :
20
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location :
Bordeaux, France
Print_ISBN :
2-86332-234-6
Type :
conf
Filename :
1503482
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1912687
