Title :
The New Limits of Optical Lithography
Author_Institution :
Integrated Technol. Div., Adv. Micro Devices, Sunnyvale, CA, USA
Abstract :
This paper outlines the broad concepts of phase shifted mask technology, off-axis illumination, and pupil-plane filtering for high resolution optical lithography and forecasts the impact these will have on 0.35 and 0.25 micron device fabrication. The limits of these technologies are assessed.
Keywords :
masks; nanofabrication; photolithography; device fabrication; off-axis illumination; optical lithography; phase shifted mask technology; pupil-plane filtering; size 0.25 micron; size 0.35 micron; Apertures; Integrated optics; Interference; Lighting; Lithography; Optical attenuators; Optical device fabrication; Optical devices; Optical films; Optical filters;
Conference_Titel :
Solid State Device Research Conference, 1993. ESSDERC '93. 23rd European
Conference_Location :
Grenoble
