Title :
Optimization of Critical Ion Implantation Steps in 0.18 um CMOS Technology
Author :
Bourenkov, A. ; Wittl, J. ; Schwalke, U. ; Lorenz, J. ; Ryssel, H.
Author_Institution :
Fraunhofer Institut f¨ur Integrierte Schaltungen, Erlangen, Germany
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location :
Bordeaux, France
Print_ISBN :
2-86332-234-6
