DocumentCode :
1913286
Title :
Permalloy films on patterned silicon substrates
Author :
Khivintsev, Yu.V. ; Filimonov, Yu.A. ; Camley, R.E. ; Celinski, Z.Ya.
Author_Institution :
Inst. of Radioeng. & Electron., RAS, Saratov
fYear :
2008
fDate :
24-25 Sept. 2008
Firstpage :
142
Lastpage :
147
Abstract :
In this paper we study effect of patterning for ferromagnetic films in the case of deposition of continuous films on pre-patterned substrates. Striped structures with the different profile depth were fabricated using photolithography, ion etching and magnetron sputtering. Magnetic force microscopy (MFM), vibrating sample magnetometry (VSM) and ferromagnetic resonance (FMR) were applied to characterize the structures. Obtained results show that such patterned ferromagnetic structures can be interesting in a sense of application in planar microwave devices based on ferromagnetic films (such as notch filters, for example) for busting operational frequency in the case when magnetic filling factor (amount of the magnetic material interacting with microwaves) is important.
Keywords :
Permalloy; ferromagnetic materials; ferromagnetic resonance; magnetic force microscopy; photolithography; sputter etching; continuous film deposition; ferromagnetic films; ferromagnetic resonance; ferromagnetic structures; ion etching; magnetic filling factor; magnetic force microscopy; magnetron sputtering; patterned silicon substrates; permalloy films; photolithography; planar microwave devices; vibrating sample magnetometry; Lithography; Magnetic films; Magnetic force microscopy; Magnetic resonance; Magnetic separation; Microwave devices; Semiconductor films; Silicon; Sputter etching; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Actual Problems of Electron Devices Engineering, 2008. APEDE '08. International Conference on
Conference_Location :
Saratov
Print_ISBN :
978-1-4244-2121-3
Electronic_ISBN :
978-1-4244-2122-0
Type :
conf
DOI :
10.1109/APEDE.2008.4720128
Filename :
4720128
Link To Document :
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