Title :
Channel Width Dependence of Hot-Carrier Induced Degradation in Shallow Trench Isolated pMOSFETs
Author :
Ishimaru, Kazunari ; Chen, Jone F. ; Hu, Chenming
Author_Institution :
Toshiba Corp., Yokohama, Japan
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location :
Bordeaux, France
Print_ISBN :
2-86332-234-6
