• DocumentCode
    1913983
  • Title

    Drain Resistance and Channel Mobility Degradation in Hot-Carrier Stresses NMOSFETs

  • Author

    Lou, C.L. ; Chim, W.K. ; Chan, D.S.H.

  • Author_Institution
    Hewlett-Packard Singapore, Singapore
  • fYear
    1998
  • fDate
    8-10 Sept. 1998
  • Firstpage
    244
  • Lastpage
    247
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference, 1998. Proceeding of the 28th European
  • Conference_Location
    Bordeaux, France
  • Print_ISBN
    2-86332-234-6
  • Type

    conf

  • Filename
    1503534