DocumentCode
1913983
Title
Drain Resistance and Channel Mobility Degradation in Hot-Carrier Stresses NMOSFETs
Author
Lou, C.L. ; Chim, W.K. ; Chan, D.S.H.
Author_Institution
Hewlett-Packard Singapore, Singapore
fYear
1998
fDate
8-10 Sept. 1998
Firstpage
244
Lastpage
247
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location
Bordeaux, France
Print_ISBN
2-86332-234-6
Type
conf
Filename
1503534
Link To Document