Title :
Drain Resistance and Channel Mobility Degradation in Hot-Carrier Stresses NMOSFETs
Author :
Lou, C.L. ; Chim, W.K. ; Chan, D.S.H.
Author_Institution :
Hewlett-Packard Singapore, Singapore
Conference_Titel :
Solid-State Device Research Conference, 1998. Proceeding of the 28th European
Conference_Location :
Bordeaux, France
Print_ISBN :
2-86332-234-6
